Document Type

Patent

Publication Date

1-18-2011

Patent Number

patent number 7871668

Abstract

The invention is directed to CVD methods and systems that can be utilized to form nanostructures. Exceptionally high product yields can be attained. In addition, the products can be formed with predetermined particle sizes and morphologies and within a very narrow particle size distribution. The systems of the invention include a CVD reactor designed to support the establishment of a convective flow field within the reactor at the expected carrier gas flow rates. In particular, the convective flow field within the reactor can include one or more flow vortices. The disclosed invention can be particularly beneficial for forming improved thermoelectric materials with high values for the figure of merit (ZT).

Application Number

12/066310

Assignees

Clemson University Research Foundation (Clemson, SC, US)

Filing Date

2006-09-22

Primary/U.S. Class

427/248.1

Other/U.S. Class

252/500, 252/518.1, 252/519.13, 252/519.14, 427/58, 427/250, 427/255.23, 427/255.28, 427/508

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